Shimura
Academic Press
Hardback
679
34547
This volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen

Semiconductors and Semimetals Volume 42

  • Publisher: Academic Press
  • ISBN: 9780127521428
  • Availability: Η διαθεσιμότητα των βιβλίων εξαρτάται από τον εκάστοτε εκδότη.
  • €315.00
  • Ex Tax: €315.00